HOU Lie-qi, LI Jie, LU Ju-sheng. ICP-AES Determination of Trace Amounts of Tantalum in High Purity Niobium[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART B:CHEMICAL ANALYSIS, 2008, 44(5): 425-426.
Citation:
HOU Lie-qi, LI Jie, LU Ju-sheng. ICP-AES Determination of Trace Amounts of Tantalum in High Purity Niobium[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART B:CHEMICAL ANALYSIS, 2008, 44(5): 425-426.
HOU Lie-qi, LI Jie, LU Ju-sheng. ICP-AES Determination of Trace Amounts of Tantalum in High Purity Niobium[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART B:CHEMICAL ANALYSIS, 2008, 44(5): 425-426.
Citation:
HOU Lie-qi, LI Jie, LU Ju-sheng. ICP-AES Determination of Trace Amounts of Tantalum in High Purity Niobium[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART B:CHEMICAL ANALYSIS, 2008, 44(5): 425-426.
ICP-AES Determination of Trace Amounts of Tantalum in High Purity Niobium
An ICP-AES method for the determination of trace amounts of tantalum in high purity niobium with standard addition calibration was studied.Range of determination of tantalum was found in the range of 50-500 μg·g-1 when concentration of coexisting niobium in the sample solution was 10 g·L-1.Values of recovery were found in range of 101%-103% and values of RSD′s (n=6) obtained were in the range of 4.0%-7.3%.
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