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    XU Hong-zhi, CHEN Zhi-wei, LIU Dong-wu, WEI Xiao-bing, WANG Ying. ICP-MS Determination of Trace Elements in High-Purity Silicon Nitride Powder[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART B:CHEMICAL ANALYSIS, 2012, 48(10): 1134-1136.
    Citation: XU Hong-zhi, CHEN Zhi-wei, LIU Dong-wu, WEI Xiao-bing, WANG Ying. ICP-MS Determination of Trace Elements in High-Purity Silicon Nitride Powder[J]. PHYSICAL TESTING AND CHEMICAL ANALYSIS PART B:CHEMICAL ANALYSIS, 2012, 48(10): 1134-1136.

    ICP-MS Determination of Trace Elements in High-Purity Silicon Nitride Powder

    • The sample of high-purity silicon nitride powder was treated with HF and HNO3 by microwave assisted digestion, and the contents of 18 trace elements in the sample solution were determined by ICP-MS. The interferences were eliminated by using suitable isotopes and applying correction formula. The values of detection limits (3s) of the found were in the range of 5.2-20.8 pg·g-1. The proposed method was applied to the analysis of sample trace elements of high-purity silicon nitride powder, giving values of recovery by standard addition method in the range of 89.20%-105.2%, and RSD′s (n=6) less than 10%.
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